ASML will open Beijing facility despite US sanctions on China
Chipmaking tool biz ASML plans to open a new facility in China this year amid rising trade tensions between Washington and ...
Semiconductor Engineering21d
EUV’s Future Looks Even Brighter
The eight-member consortium — which includes Toyota, Sony, MUFG Bank, NTT, Denso, Kioxia, NEC, and Softbank — installed ASML’s NXE:3800E EUV scanner at its IIM-1 fab in Hokkaido, Japan, with plans to ...
EurekAlert!2d
New Irresistible Materials CEO to drive commercialization and market adoption
Irresistible Materials, Ltd (IM), a leader in the development of novel resist materials for extreme ultraviolet (EUV) ...
New Electronics16d
First test results obtained on 20nm pitch metal line structure
E-test results obtained on 20nm pitch metal line structures patterned after single-exposure High NA EUV lithography.
TheBusinessDesk.com1d
People: Savills; Glancy Nicholls Architects; Irresistible Materials
Glancy Nicholls Architects (GNA) has promoted two longstanding members of staff to senior positions within the company.
Silicon Semiconductor15d
Imec demonstrates electrical yield for 20nm pitch metal lines obtained with High NA EUV single patterning
In August 2024, imec was the first to present industry-relevant logic and DRAM structures patterned in a single High NA EUV ...