Intel announced that it had installed ASML's Twinscan EXE:5200B, the industry's first High-NA lithography tool with 0.55 numerical aperture projection optics made for commercial chip production. The ...

Tokyo, Japan-based Canon Inc. today announced three new lithography tools for 300mm wafers. Canon’s San Jose-based subsidiary, Canon U.S.A. Inc., today started taking orders for a 300mm-compatible ...

ASML is on track to ship the industry's first extreme ultraviolet (EUV) lithography scanner with a 0.55 numerical aperture (NA) this year. Company CEO Peter Wennink said that ASML's Twinscan EXE:5000 ...

BELMONT, Calif. — Look for Nikon Inc. to introduce a new version of its lithography tools, based on 193-nanometer argon-fluoride (ArF) technology, at next month's Semicon West trade show, according to ...

ASML has just officially shipped its very first High-NA EUV lithography scanner to Intel, with the sparkling new Twinscan EXE:5000 extreme ultraviolet (EUV) scanner being the first High-NA scanner ...

New VeritySEM ® 10 system delivers industry-leading resolution and imaging speed to help chipmakers accelerate process development and maximize yield in high-volume manufacturing SANTA CLARA, Calif., ...

Several vendors are rolling out next-generation inspection systems and software that locates problematic defects in chips caused by processes in extreme ultraviolet (EUV) lithography. Each defect ...

OYAMA, Japan--(BUSINESS WIRE)--GIGAPHOTON INC. (Head Office: Oyama, Tochigi; President and CEO: Katsumi Uranaka), a manufacturer of light sources used in semiconductor lithography, has announced that ...

SANTA CLARA, Calif., March 14, 2023 /PRNewswire/ -- Picarro Inc., a leading provider of chemical metrology systems for advanced semiconductor fabs, today announced the SLiM 100 Lithography Process ...

After a period of delays, EUV pellicles are emerging and becoming a requirement in high-volume production of critical chips. At the same time, the pellicle landscape for extreme ultraviolet (EUV) ...