Comparison between conventional imaging using an imaging system (left) and “diffractive imaging” (right). Our EUV diffractive imaging experiment setup. A photo of the high-harmonic generation (HHG) ...

A California-based laboratory is set to lay the groundwork for the next evolution of extreme ultraviolet (EUV) lithography. Led by Lawrence Livermore National Laboratory (LLNL), the project aims for ...

Legendary Intel CTO and CEO Pat Gelsinger is now serving as executive chairman at xLight, a startup that develops a free electron laser (FEL) technology as a light source for extreme ultraviolet (EUV) ...

There is a new type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below. Professor Tsumoru Shintake ...

EUV, extreme ultraviolet lithography, is nearly completely associated with the Dutch company ASML, the only maker of EUV machines that are used by TSMC, Intel and other chip manufacturers of advanced ...

Laser-plasma interactions represent a cornerstone of high-energy-density physics, where intense laser pulses interact with solid or gaseous targets to generate plasmas. This process underpins the ...

Trump administration will get equity stake in xLight, which has been developing particle accelerator technology at several national labs and Cornell Construction of the NanoFab Reflection, home of the ...

US startup aims to develop free-electron lasers directly emitting EUV light, in place of today’s laser-driven plasma systems. xLight, a US startup aiming to commercialize particle accelerator driven ...

Figure 1. Comparison between conventional imaging using an imaging system (left) and “diffractive imaging” (right). In both cases, the sample needs to be illuminated by EUV light. However, the ...